There are varies of gases in semiconductor industry. Which including up to 100 kinds of toxic or corrosive gases. According to the application, we can classify the specialty gases as followings:
1. Si group gas: silane-containing silanes such as SiH 4, SiH2Cl2, Si2H6.
2. Doped gas: boron, phosphorus, arsenic and other three groups and five atoms of the gas, such as BCl3, BF 3, PH3.
3. Etching cleaning gas: halogen-containing halide and halogen compounds, such as Cl 2, NF3, HBr, CF4, C2F6.
4. Reaction gas: carbon and nitrogen-based oxide, such as CO2, NH3, N2O.
5. Metal vapor deposition gas: metal containing halogen and organic alkanes such as WF 6, Ga (CH3) 3).
In the process of semiconductor compound growth, in addition to pure specialty gas, but also need part of the mixture gas, mainly including SiH4 / H2.SiH4 / N2 as a film source, although not large, but the product quality requirements are extremely high.
