Specialty Gases

Specialty Gases

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  • Carbon Tetrafluoride, CF4 Specialty Gas

  • Carbon Tetrafluoride, CF4 Specialty Gas

  • Carbon Tetrafluoride, CF4 Specialty Gas

Carbon Tetrafluoride, CF4 Specialty Gas

CAS NO 75-73-0
UN NO 1982
EINECS NO 200-896-5
Molecular weight 88
Appearance Colorless, Odorless
Melting point -184 ℃
Boiling point -128.1 ℃
Density 3.72 kg/m³
DOT Class 2.2
Label Non-flammable Gas


Teflon is a cryogenic refrigerant that is relatively inert under normal conditions, an oxygen displacer, and is also used in various wafer etching processes.

Tetrafluoromethane, also known as carbon tetrafluoride or R-14, is the simplest perfluorocarbon ( CF4 ). As its IUPAC name suggests, tetrafluoromethane is the perfluorinated counterpart of hydrocarbon methane. It can also be classified as haloalkane or halomethane. Tetrafluoromethane is a useful refrigerant, but also a potent greenhouse gas. It has a very high bond strength due to the nature of the carbon-fluorine bond.


Properties of CF4 Specialty Gas:

Chemical stability: CF4 is a very stable compound and does not react easily with other substances, especially at normal temperature and pressure.

Greenhouse effect: Despite its low concentration in the atmosphere, CF4 is a very strong greenhouse gas with a very high Global Warming Potential (GWP), about 7390 times higher than carbon dioxide (in a 100-year time frame).

Physical properties:

Molecular weight is 88 g/mol.

It is gaseous at standard temperature and pressure and has a boiling point of about -128°C.

It is denser than air and tends to settle.

Safety: Although CF4 itself is non-flammable, because it is a compressed gas stored in a high-pressure container, it needs to be handled with care to avoid dangers caused by container damage. In addition, its leakage in a confined space may cause a risk of suffocation because it will replace oxygen in the air.


Carbon Tetrafluoride Gas Usage


Tetrafluoromethane is sometimes used as a cryogenic refrigerant (R-14). It can be used alone for electronic microfabrication or in combination with oxygen as a plasma etchant for silicon, silicon dioxide and silicon nitride. It is also used in neutron detectors.


Applications of CF4 Specialty Gas:

Semiconductor industry: CF4 is one of the most commonly used gases in plasma etching processes in the microelectronics industry, used to etch thin film materials.

Electrical insulation and arc extinguishing: Due to its excellent electrical insulation and arc extinguishing properties, CF4 is used in high-voltage systems to maintain system integrity and safety.

Refrigerant: Used as R-14 refrigerant, it plays a role in some specific low-temperature refrigeration applications.


Carbon Tetrafluoride, CF4 Specialty Gas


Plasma etching process for various integrated circuits

Plasma etching process for various integrated circuits

Low temperature refrigerant

Low temperature refrigerant

99.999% CF4, Electronic Grade

Specification99.999%
Oxygen + Argon≤ 1 ppm
Nitrogen≤ 2 ppm
Hydrogen≤ 0.3 ppm
Carbon Monoxide≤ 0.3 ppm
Carbon Dioxide≤ 0.3 ppm
Sulfur Hexafluoride≤ 0.3 ppm
THC≤ 0.3 ppm
Trifluoromethane≤ 0.3 ppm
OFC≤ 1 ppm
Moisture≤ 1 ppm
Acidity as HF≤ 0.1 ppm

*Other Grades and Purity Available on Asking

Package Information

Cylinder SpecificationsContents
Cylinder CapacityValveWeight
47LCGA58030 kgs

*Other Packages Available on Asking

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Carbon Tetrafluoride, CF4 Specialty Gas
Carbon Tetrafluoride, CF4 Specialty Gas
Carbon Tetrafluoride, CF4 Specialty Gas
Carbon Tetrafluoride, CF4 Specialty Gas

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