CAS NO | 75-73-0 |
UN NO | 1982 |
EINECS NO | 200-896-5 |
Molecular weight | 88 |
Appearance | Colorless, Odorless |
Melting point | -184 ℃ |
Boiling point | -128.1 ℃ |
Density | 3.72 kg/m³ |
DOT Class | 2.2 |
Label | Non-flammable Gas |
Teflon is a cryogenic refrigerant that is relatively inert under normal conditions, an oxygen displacer, and is also used in various wafer etching processes.
Tetrafluoromethane, also known as carbon tetrafluoride or R-14, is the simplest perfluorocarbon ( CF4 ). As its IUPAC name suggests, tetrafluoromethane is the perfluorinated counterpart of hydrocarbon methane. It can also be classified as haloalkane or halomethane. Tetrafluoromethane is a useful refrigerant, but also a potent greenhouse gas. It has a very high bond strength due to the nature of the carbon-fluorine bond.
Chemical stability: CF4 is a very stable compound and does not react easily with other substances, especially at normal temperature and pressure.
Greenhouse effect: Despite its low concentration in the atmosphere, CF4 is a very strong greenhouse gas with a very high Global Warming Potential (GWP), about 7390 times higher than carbon dioxide (in a 100-year time frame).
Physical properties:
Molecular weight is 88 g/mol.
It is gaseous at standard temperature and pressure and has a boiling point of about -128°C.
It is denser than air and tends to settle.
Safety: Although CF4 itself is non-flammable, because it is a compressed gas stored in a high-pressure container, it needs to be handled with care to avoid dangers caused by container damage. In addition, its leakage in a confined space may cause a risk of suffocation because it will replace oxygen in the air.
Tetrafluoromethane is sometimes used as a cryogenic refrigerant (R-14). It can be used alone for electronic microfabrication or in combination with oxygen as a plasma etchant for silicon, silicon dioxide and silicon nitride. It is also used in neutron detectors.
Applications of CF4 Specialty Gas:
Semiconductor industry: CF4 is one of the most commonly used gases in plasma etching processes in the microelectronics industry, used to etch thin film materials.
Electrical insulation and arc extinguishing: Due to its excellent electrical insulation and arc extinguishing properties, CF4 is used in high-voltage systems to maintain system integrity and safety.
Refrigerant: Used as R-14 refrigerant, it plays a role in some specific low-temperature refrigeration applications.
Plasma etching process for various integrated circuits
Low temperature refrigerant
99.999% CF4, Electronic Grade
Specification | 99.999% |
Oxygen + Argon | ≤ 1 ppm |
Nitrogen | ≤ 2 ppm |
Hydrogen | ≤ 0.3 ppm |
Carbon Monoxide | ≤ 0.3 ppm |
Carbon Dioxide | ≤ 0.3 ppm |
Sulfur Hexafluoride | ≤ 0.3 ppm |
THC | ≤ 0.3 ppm |
Trifluoromethane | ≤ 0.3 ppm |
OFC | ≤ 1 ppm |
Moisture | ≤ 1 ppm |
Acidity as HF | ≤ 0.1 ppm |
*Other Grades and Purity Available on Asking
Package Information
Cylinder Specifications | Contents | |
Cylinder Capacity | Valve | Weight |
47L | CGA580 | 30 kgs |
*Other Packages Available on Asking
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Advantanges
More than fifteen years on the market.
ISO certificate manufacturer & Stable raw material source.
On-line analysis system for gas quality control in every step, highly close to 100% pass rate.
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